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Originally Posted by Trip
I disagree. Two main points to Eclipse. Resistance and (if your intent is "perma") recharge rate. Currently...
Recharge: 78.55% (Pre-Ed 79.5%) Resistance: 54.16% (Pre-ED 57.38%) The extra endurance is slotted for a simple boost. Giving some situations it is helpful. Some may find it is not required. However, I obviously do. Accuracy is not any issue on my build and slotting for such it not required on my end. Some players characters are built differently and may require a different approach. |
I could see not worrying about overslotting accuracy on your attacks because of the massive tohit buff from mire, but I always use Eclipse before mire so I find it necessary to have good accuracy value baked into the power.
The nucleos are good because they give you fantastic resistance and accuracy values with 2 slots- I actually keep my Eclipse perma w/ 1 Recharge IO, but I like the second for breathing room and exemping.
Just wanted to elaborate a little on my last post- The slotting of 2 Nucleolus Exposure in Eclipse brings you from 0-85% resistance to all damage with 5 targets, and it does it in 2 slots while still providing great accuracy value. On my personal build, like I said, only 1/2 of the recharge IO's are needed to keep Eclipse perma at level 50, but I like to have the second one. If you were intent on slotting Eclipse for end mod, you could technically slot it with 2 Nucleos, 1 recharge IO, and 3 End Mod IO's.. not that I would suggest it. Due to ED, I don't think there is any slotting that will cap your resists with less than 5 targets, and I'm 99.9% sure that no slotting will let you do so in only 2 slots.
Recharge: 78.55% (Pre-Ed 79.5%)
Resistance: 54.16% (Pre-ED 57.38%)
The extra endurance is slotted for a simple boost. Giving some situations it is helpful. Some may find it is not required. However, I obviously do.
Accuracy is not any issue on my build and slotting for such it not required on my end. Some players characters are built differently and may require a different approach.